About this scholarly article

SPIE Proceedings [SPIE Advanced Microelectronic Manufacturing - Santa Clara, CA (Sunday 23 February 2003)] Process and Materials Characterization and Diagnostics in IC Manufacturing - X-ray reflectivity: a new metrology alternative for DUV ARCs by Agnihotri, Dileep; Tobin, Jr., Kenneth W.; Emami, Iraj; Calhoun, Derek; Formica, Joseph; Harmon, Joseph; Nevala, Lance is a scholarly article available to read on EtoBox.

Author

Agnihotri, Dileep; Tobin, Jr., Kenneth W.; Emami, Iraj; Calhoun, Derek; Formica, Joseph; Harmon, Joseph; Nevala, Lance

Publisher

SPIE

Published

2003