About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry by Ngo, Yit Sung; Starikov, Alexander; Qu, Yifan; Tay, Arthur; Lee, Tong Heng is a scholarly article available to read on EtoBox.

Author

Ngo, Yit Sung; Starikov, Alexander; Qu, Yifan; Tay, Arthur; Lee, Tong Heng

Publisher

SPIE

Published

2012