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This paper introduces a composite function model combining a power function and a Gaussian function to improve proximity effect correction (PEC) in electron beam lithography (EBL). The model enhances the accuracy of the point spread function (PSF) while reducing computational complexity, outperforming traditional methods like the double Gaussian and Monte Carlo models. Experimental validation demonstrated its effectiveness in fabricating high-resolution structures, such as hydrogen silsesquioxane (HSQ) zone

Author

mandalsaheb597

Language

EN