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About this Materials Science article
Comparative study of pulsed laser deposited HfO2 and Hf–aluminate films for high-k gate dielectric applications by J. Zhu; Z.G. Liu is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- J. Zhu; Z.G. Liu
- Publisher
- Springer; Springer-Verlag; Springer Verlag; Springer Science and Business Media LLC (ISSN 1432-0630)
- Published
- 2004
- Field
- Materials Science (Physical Sciences)