About this scholarly article

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Calculating aerial images from EUV masks by Pistor, Thomas V.; Neureuther, Andrew R.; Vladimirsky, Yuli is a scholarly article available to read on EtoBox.

Author

Pistor, Thomas V.; Neureuther, Andrew R.; Vladimirsky, Yuli

Publisher

SPIE

Published

1999

Language

EN