About this scholarly article

SPIE Proceedings [SPIE Micro - DL tentative - San Jose, CA (Friday 1 March 1991)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing - Defect repair for gold absorber/silicon membrane x-ray masks by Stewart, Diane K.; Fuchs, Jacob; Grant, Robert A.; Plotnik, Irving; Peckerar, Martin C. is a scholarly article available to read on EtoBox.

Author

Stewart, Diane K.; Fuchs, Jacob; Grant, Robert A.; Plotnik, Irving; Peckerar, Martin C.

Publisher

SPIE

Published

1991