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About this Engineering article
Reliability of HfSiON gate dielectrics by O'Connor, Robert; Hughes, Greg; Degraeve, Robin; Kaczer, Ben; Kauerauf, Thomas is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- O'Connor, Robert; Hughes, Greg; Degraeve, Robin; Kaczer, Ben; Kauerauf, Thomas
- Publisher
- Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0268-1242)
- Published
- 2004
- Field
- Engineering (Physical Sciences)
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