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About this Engineering article

Improvement in the electrical properties of thin gate oxides by chemical-assisted electron stressing followed by annealing (CAESA) by Yen-Hao Shih, ; Jenn-Gwo Hwu, is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Yen-Hao Shih, ; Jenn-Gwo Hwu,
Publisher
IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0741-3106)
Published
1999
Language
EN
Field
Engineering (Physical Sciences)

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