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Covalent Layer-by-Layer Assembly of Redox Active Molecular Multilayers on Silicon (100) by Photochemical Thiol-Ene Chemistry by Christian Schulz; Susann Nowak; Roland Fröhlich; Bart Jan Ravoo is a Engineering article available to read on EtoBox.

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## Abstract The fabrication of thin organic films covalently grafted onto silicon substrates is of significant interest, as they are expected to give access to a broad range of new materials for integration into microelectronic applications. Covalent layer‐by‐layer (LbL) assembly offers a high degree of freedom when designing such thin films. In this work an approach for the preparation of covalent redox active molecular multilayers on silicon (100) surfaces is presented using a highly branched decaallylferrocene and thiol‐ene click chemistry. The multilayers are analyzed by ellipsometry, X‐ray photoelectron sprectroscopy, and cyclic voltammetry. The results indicate that the multilayer growth is linear for at least sixteen layers and the density of ferrocenes per layer is in the range of 6 × 10^−11^ mol cm^−2^. Moreover, this method for LbL assembly is extended to surfaces which have been locally passivated by microcontact printing. By atomic force microscopy measurements it is possible to show that the covalent LbL deposition proceeds exclusively in the nonpassivated areas.

Who reads Covalent Layer-by-Layer Assembly of Redox Active Molecular Multilayers on Silicon (100) by Photochemical Thiol-Ene Chemistry?

Author

Christian Schulz; Susann Nowak; Roland Fröhlich; Bart Jan Ravoo

Publisher

John Wiley and Sons; Wiley (John Wiley & Sons); Wiley - V C H Verlag GmbbH & Co.; Publons; Wiley (ISSN 1613-6810)

Published

2011

Language

EN

Field

Engineering (Physical Sciences)