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This document contains solutions to homework problems related to photolithography and semiconductor manufacturing. Problem 1 determines that Stepper B can meet the resolution and depth of focus requirements for patterning. Problem 2 calculates the maximum temperature variation allowed to prevent misalignment between photomasks and wafers. Problem 3 analyzes runout and rotational errors on a wafer. Problem 4 discusses effects of standing waves and reflections in photoresist. Problem 5 examines resist profile

Author

Đặng Ngọc Thưởng

Language

EN