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ToF‐SIMS depth profiling of a complex polymeric coating employing a C~60~ sputter source by Steven J. Hinder; Chris Lowe; John F. Watts is a Engineering article available to read on EtoBox.
What is ToF‐SIMS depth profiling of a complex polymeric coating employing a C~60~ sputter source about?
## Abstract A complex poly(vinylidene difluoride) (PVdF)/poly(methyl methacrylate) (PMMA)‐based coil coating formulation has been investigated using time‐of‐flight SIMS (ToF‐SIMS). Employing a Bi~3~^+^ analysis source and a Buckminsterfullerene (C~60~) sputter source, depth profiles were obtained through the polymeric materials in the outer few nanometres of the PVdF topcoat. These investigations demonstrate that the PVdF coating's air/coating interface is composed principally of the flow agent included in the formulation. Elemental depth profiles obtained in the negative ion mode demonstrate variations in the carbon, oxygen and fluorine concentrations within the coating with respect to depth. All three elemental depth profiles suggest that the PVdF coating bulk possesses a constant material composition. The oxygen depth profile reveals the presence of a very thin oxygen‐rich sub‐surface layer in the PVdF coating, observed within the first second of the sputter/etch profile. Retrospectively, extracted mass spectra (from the elemental depth profile raw data set) of the PVdF coating sub‐surface and bulk layers indicates this oxygen‐rich sub‐surface layer results from segregation of t
Who reads ToF‐SIMS depth profiling of a complex polymeric coating employing a C~60~ sputter source?
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- Author
- Steven J. Hinder; Chris Lowe; John F. Watts
- Publisher
- John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley; Research Square (ISSN 0142-2421)
- Published
- 2007
- Language
- EN
- Field
- Engineering (Physical Sciences)
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