About this scholarly article

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - New materials for 193-nm trilayer imaging by Meador, Jim D.; Sturtevant, John L.; Holmes, Doug; Nagatkina, Mariya I.; Puligadda, Rama; Gum, Denise; Bennett, Randy; Sun, Sam X.; Enomoto, Tomoyuki is a scholarly article available to read on EtoBox.

Author

Meador, Jim D.; Sturtevant, John L.; Holmes, Doug; Nagatkina, Mariya I.; Puligadda, Rama; Gum, Denise; Bennett, Randy; Sun, Sam X.; Enomoto, Tomoyuki

Publisher

SPIE

Published

2004

Language

EN