About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Designing materials for advanced microelectronic patterning applications using controlled polymerization RAFT technology by Sheehan, Michael T.; Allen, Robert D.; Somervell, Mark H.; Farnham, William B.; Chambers, Charles R.; Tran, Hoang V.; Okazaki, Hiroshi; Brun, Yefim; Romberger, Matthew L.; Sounik, James R. is a scholarly article available to read on EtoBox.

Author

Sheehan, Michael T.; Allen, Robert D.; Somervell, Mark H.; Farnham, William B.; Chambers, Charles R.; Tran, Hoang V.; Okazaki, Hiroshi; Brun, Yefim; Romberger, Matthew L.; Sounik, James R.

Publisher

SPIE

Published

2011

Language

EN