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About this Engineering article
Charge Trapping Related Degradation of Thin HfAlO∕SiO[sub 2] Gate Dielectric Stack during Constant-Voltage Stress by Samanta, Piyas; Cheng, Chin-Lung; Lee, Yao-Jen is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Samanta, Piyas; Cheng, Chin-Lung; Lee, Yao-Jen
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
- Published
- 2009
- Language
- EN
- Field
- Engineering (Physical Sciences)
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