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About this Engineering article
FTIR Study of Porous Low Dielectric Constant SiOC Film under Various Post-Deposition Curing Conditions by Massimo Sardo; Anissa Lagha; Aurelie Humbert; Morgane Desbois; Nicolas Laurent is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Massimo Sardo; Anissa Lagha; Aurelie Humbert; Morgane Desbois; Nicolas Laurent
- Publisher
- The Electrochemical Society (ISSN 2151-2043)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)