Opening book details…
About this Engineering article
Dry etching characteristics of TiN thin films in CF4/BCl3/N2 plasma by Young-Hee Joo; Jong-Chang Woo; Chang-Il Kim is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Young-Hee Joo; Jong-Chang Woo; Chang-Il Kim
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2012
- Language
- EN
- Field
- Engineering (Physical Sciences)
More by Young-Hee Joo; Jong-Chang Woo; Chang-Il Kim
Browse all works by Young-Hee Joo; Jong-Chang Woo; Chang-Il Kim