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EUV Lithography, Second Edition: Pm283 by Bakshi, Vivek, editor; Society of Photo-optical Instrumentation Engineers, publisher is a nonfiction available to read on EtoBox.

What is EUV Lithography, Second Edition: Pm283 about?

Extreme ultraviolet lithography (EUVL) is the principal lithography technology—beyond the current 193-nm-based optical lithography—aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL used in the field. Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for next-generation lithography. In 2008, EUVL was a prime contender to replace 193-nm-based optical lithography in leading-edge computer chip making, but not everyone was convinced at that point. Switching from 193-nm to 13.5-nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography—light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials, and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, fo

Who reads EUV Lithography, Second Edition: Pm283?

Author

Bakshi, Vivek, editor; Society of Photo-optical Instrumentation Engineers, publisher

Publisher

Society of Photo-Optical Instrumentation Engineers

Published

2017

Language

EN

ISBN

9781510616790

Category

nonfiction

Subjects

Engineering, Science, Physics