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About this Materials Science article
Reactive ion etching characterization of a-SiC: H in CF4/O2 plasma by G. Saggio; E. Verona; P. Di Rosa; S. La Monica; R. Salotti; L. Schirone is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- G. Saggio; E. Verona; P. Di Rosa; S. La Monica; R. Salotti; L. Schirone
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd; Elsevier BV (ISSN 0921-5107)
- Published
- 1995
- Language
- EN
- Field
- Materials Science (Physical Sciences)
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