About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening by Hayashi, Naoya; Kasprowicz, Bryan S.; Choi, Jaehyuck; Kim, Jinsu; Lowe, Jeff; Dattilo, Davide; Koh, Soowan; Choi, Jun Yeol; Dietze, Uwe; Shoki, Tsutomu; Kim, Byung Gook; Jeon, Chan-Uk is a scholarly article available to read on EtoBox.

Author

Hayashi, Naoya; Kasprowicz, Bryan S.; Choi, Jaehyuck; Kim, Jinsu; Lowe, Jeff; Dattilo, Davide; Koh, Soowan; Choi, Jun Yeol; Dietze, Uwe; Shoki, Tsutomu; Kim, Byung Gook; Jeon, Chan-Uk

Publisher

SPIE

Published

2015

Language

EN