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About this Engineering article

(Invited) ScAlN: A Novel Barrier Material for High Power GaN-Based RF Transistors by Hardy, Matthew T.; Downey, Brian P.; Nepal, Neeraj; Storm, David F.; Katzer, D. Scott; Meyer, David J. is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Hardy, Matthew T.; Downey, Brian P.; Nepal, Neeraj; Storm, David F.; Katzer, D. Scott; Meyer, David J.
Publisher
The Electrochemical Society; Electrochemical Society, Inc. (ISSN 1938-6737)
Published
2017
Language
EN
Field
Engineering (Physical Sciences)