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Electron‐beam Lithography of Chlorinated Polystyrenes with Narrow Molecular Weight Distributions by Eugene D. Feit; Larry E. Stillwagon is a Materials Science article available to read on EtoBox.

What is Electron‐beam Lithography of Chlorinated Polystyrenes with Narrow Molecular Weight Distributions about?

## Abstract Polystyrenes with narrow molecular weight distributions have been chlorinated with only slight broadening of molecular weight distributions to yield materials that are five to six times more sensitive to electron‐beam irradiation. The chlorinated polystyrenes are useful negative resists for electron‐beam lithography. At molecular weights of 3‐4 × 10^5^g/mole, their threshold sensitivities to 20 keV electrons are 1‐2μC/cm^2^. Their lithographic contrasts are ≥ 1.5; in fact, > 2.0 for the narrowest molecular weight distributions. They compare favorably in these regards to polystyrenes of similar molecular weight characteristics. Lithographic relief images that are 80% of the original thickness of the polymer film can be formed at three to four times the threshold dose. The degree of chlorination ranged from 0.65‐0.76 Cl/monomer unit. The infrared spectra of the chlorinated materials resemble the spectrum for poly(4‐chlorostyrene). Elemental analysis indicated, however that some addition of chlorine had occurred. More extensive chlorination or chlorination of the higher molecular weight starting materials broadened the molecular weight distributions. The chlorinated materi

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Author

Eugene D. Feit; Larry E. Stillwagon

Publisher

Society for Plastic Engineers; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley (ISSN 0032-3888)

Published

1980

Language

EN

Field

Materials Science (Physical Sciences)