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This study investigated the erosion behavior of yttria (Y2O3) when exposed to fluorine-based plasma etching conditions. Nearly defect-free polycrystalline yttria samples were prepared using field-assisted sintering and then exposed to plasma for up to 2 hours. Various characterization techniques were used to study the surface morphology and near-surface region before and after plasma exposure. The results revealed an orientation-dependent erosion mechanism in yttria that forms plateau-like surface structure

Author

bitasseomnam

Language

EN