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About this Engineering article
Smooth etching of various III/V and II/VI semiconductors by Cl2 reactive ion beam etching by T. Yoshikawa is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- T. Yoshikawa
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 1996
- Field
- Engineering (Physical Sciences)