Opening book details…
Can I read Wafer-scale Transfer of Nanoimprinted Patterns Into Silicon Substrates on EtoBox?
Wafer-scale Transfer of Nanoimprinted Patterns Into Silicon Substrates by G. Hubbard; S.J. Abbott; Q. Chen; D.W.E. Allsopp; W.N. Wang; C.R. Bowen; R. Stevens; A. Šatka; D. Haško; F. Uherek; J. Kováč is a Physics and Astronomy article available to read on EtoBox.
What is Wafer-scale Transfer of Nanoimprinted Patterns Into Silicon Substrates about?
A simple low cost method of nanoimprinting has been developed. The technique uses a flexible disposable master and lends itself to roll-to-roll processing. Residual layer thicknesses of 5-10 nm are routinely achieved. This enables the critical step of pattern transfer into hard substrates by reactive ion etching, an essential step in the fabrication of sub-wavelength photonic device elements on a waferscale.
Who reads Wafer-scale Transfer of Nanoimprinted Patterns Into Silicon Substrates?
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- G. Hubbard; S.J. Abbott; Q. Chen; D.W.E. Allsopp; W.N. Wang; C.R. Bowen; R. Stevens; A. Šatka; D. Haško; F. Uherek; J. Kováč
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 1386-9477)
- Published
- 2009
- Language
- EN
- Field
- Physics and Astronomy (Physical Sciences)