About this scholarly article

CAS '99 Proceedings. 1999 International Semiconductor Conference (Cat. No.99TH8389) - Influence of a shallow p+ offset region on a novel edge termination technique using lightly doped p-rings by Bose, J.V.S.C.; De Souza, M.M.; Narayanan, E.M.S.; Spulber, O.; Sweet, M. is a scholarly article available to read on EtoBox.

Author

Bose, J.V.S.C.; De Souza, M.M.; Narayanan, E.M.S.; Spulber, O.; Sweet, M.

Publisher

IEEE

Published

1999

Language

EN