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Chemically patterned, metal oxide based surfaces produced by photolithographic techniques for studying protein– and cell–surface interactions I: Microfabrication and surface characterization by M Winkelmann; J Gold; R Hauert; B Kasemo; N.D Spencer; D.M Brunette; M Textor is a Engineering article available to read on EtoBox.

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Chemical patterns on smooth wafer substrates comprising areas with two different metals have been produced by vacuum metal deposition and photolithographic techniques. The combination of metals has been chosen from the series titanium (Ti), aluminium (Al), vanadium (V) and niobium (Nb), producing patterns (dots and stripes with dimensions of 50, 100 and 150 micrometer) with one of the metals as the background and with the second metal (foreground pattern) deposited on the background metal. The structure and chemical composition of the patterned surfaces were evaluated by scanning electron microscopy, X-ray photoelectron spectroscopy and imaging time-of-flight secondary-ion mass spectrometry. The surfaces proved to be geometrically well defined with the expected surface-chemical composition, i.e. a surface oxide (passive) film essentially composed of TiO(2),Al(2)O(3),V(2)O(5), or Nb(2)O(5). Ti/Ti patterned surfaces were produced as controls and found to show no chemical composition contrast. The surface roughness of the pattern was greater than that of the background by a factor of 2-3, but was still extremely smooth with Ra<2nm. The patterns serve as model surfaces for studying in

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Author

M Winkelmann; J Gold; R Hauert; B Kasemo; N.D Spencer; D.M Brunette; M Textor

Publisher

Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0142-9612)

Published

2003

Language

EN

Field

Engineering (Physical Sciences)