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About this Engineering article
Refractive index and extinction coefficient of Si at 400 nm between 10 and 300 K by Nagakubo, Akira; Ogi, Hirotsugu; Hirao, Masahiko is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Nagakubo, Akira; Ogi, Hirotsugu; Hirao, Masahiko
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2015
- Field
- Engineering (Physical Sciences)
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