About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Dependence of defect size and shape on detectability for EUV patterned mask inspection by Wood, Obert R.; Panning, Eric M.; Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro is a scholarly article available to read on EtoBox.

Author

Wood, Obert R.; Panning, Eric M.; Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro

Publisher

SPIE

Published

2015

Language

EN