About this scholarly article

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Atomic force metrology and 3D modeling of microtrenching in etched photomask features by Todd, Bradley; Miller, Kirk; Pistor, Thomas V.; Kawahira, Hiroichi is a scholarly article available to read on EtoBox.

Author

Todd, Bradley; Miller, Kirk; Pistor, Thomas V.; Kawahira, Hiroichi

Publisher

SPIE

Published

2001

Language

EN