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About this Engineering article
Effect of Capacitive Coupling on Inductively Coupled Fluorocarbon Plasma Processing by Schaepkens, M.; Rueger, N. R.; Beulens, J. J.; Li, X.; Standaert, T. E. F. M.; Matsuo, P. J.; Oehrlein, G. S. is a Engineering article available to read on EtoBox.
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- Author
- Schaepkens, M.; Rueger, N. R.; Beulens, J. J.; Li, X.; Standaert, T. E. F. M.; Matsuo, P. J.; Oehrlein, G. S.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 1999
- Language
- EN
- Field
- Engineering (Physical Sciences)