Opening book details…
About this Engineering article
Thickness-dependent void fraction of rf-sputtered amorphous Ge films by spectroscopic ellipsometry by P. J. Mcmarr; J. R. Blanco; K. Vedam; R. Messier; L. Pilione is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- P. J. Mcmarr; J. R. Blanco; K. Vedam; R. Messier; L. Pilione
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1986
- Language
- EN
- Field
- Engineering (Physical Sciences)
More by P. J. Mcmarr; J. R. Blanco; K. Vedam; R. Messier; L. Pilione
Browse all works by P. J. Mcmarr; J. R. Blanco; K. Vedam; R. Messier; L. Pilione