About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Exploring the limitations of x-ray reflectivity as a critical dimension pattern shape metrology by Lee, Hae-Jeong; Allgair, John A.; Raymond, Christopher J.; Kim, Sangcheol; Soles, Christopher L.; Lin, Eric K.; Wu, Wen-Li is a scholarly article available to read on EtoBox.

Author

Lee, Hae-Jeong; Allgair, John A.; Raymond, Christopher J.; Kim, Sangcheol; Soles, Christopher L.; Lin, Eric K.; Wu, Wen-Li

Publisher

SPIE

Published

2008

Language

EN