About this scholarly article

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III - Resolution limitation of x-ray proximity lithography--secondary electron and waveguide effects by Ogawa, Taro; Murayama, Seiichi; Mochiji, Kozo; Takeda, Eiji; Patterson, David O. is a scholarly article available to read on EtoBox.

Author

Ogawa, Taro; Murayama, Seiichi; Mochiji, Kozo; Takeda, Eiji; Patterson, David O.

Publisher

SPIE

Published

1993