About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Metrology for directed self-assembly block lithography using optical scatterometry by Cain, Jason P.; Sanchez, Martha I.; Dixit, Dhairya; Kamineni, Vimal; Farrell, Richard; Hosler, Erik; Preil, Moshe; Race, Joseph; Peterson, Brennan; Diebold, Alain C. is a scholarly article available to read on EtoBox.

Author

Cain, Jason P.; Sanchez, Martha I.; Dixit, Dhairya; Kamineni, Vimal; Farrell, Richard; Hosler, Erik; Preil, Moshe; Race, Joseph; Peterson, Brennan; Diebold, Alain C.

Publisher

SPIE

Published

2014

Language

EN