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Advanced Excimer Laser Crystallization Techniques by L. Mariucci; A. Pecora; R. Carluccio; G. Fortunato is a Engineering article available to read on EtoBox.

What is Advanced Excimer Laser Crystallization Techniques about?

In high performance polysilicon thin film transistors TFTs the uniformity of electrical characteristics remain a major problem. This situation has stimulated a growing activity aiming to control the lateral growth phenomenon. However, most of the techniques require additional processing steps or a rather high shot density. We present a technique based on a two-pass excimer laser crystallization process: during the first irradiation the sample is irradiated through a patterned mask, while the second irradiation, performed without the mask, results in the homogeneous crystallization of the sample. This technique allows the Ž . possibility of forming uniform polysilicon layers, with large ; 2 micron and aligned grains, with a reduced number of shots and a relatively large process energy window. The results of crystallization performed at different laser energy densities, sample thickness and laser pulse duration are analyzed.

Who reads Advanced Excimer Laser Crystallization Techniques?

Author

L. Mariucci; A. Pecora; R. Carluccio; G. Fortunato

Publisher

Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)

Published

2001

Language

EN

Field

Engineering (Physical Sciences)