About this Engineering article
Comparative Growth Kinetics Of Sige In A Commercial Reduced Pressure Chemical Vapour Deposition Epi Reactor And Anomalies During Growth of Thin Si Layers on Sige by Caymax, Matity; Loo, Roger; Brijs, Bert; Vandervorst, Wilfried; Howard, David J; Kimura, Kenji; Nakajima, Kaoru is a Engineering article available to read on EtoBox.
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- Author
- Caymax, Matity; Loo, Roger; Brijs, Bert; Vandervorst, Wilfried; Howard, David J; Kimura, Kenji; Nakajima, Kaoru
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1998
- Field
- Engineering (Physical Sciences)