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This document discusses electron beam lithography (EBL), including its patterning techniques, types of EBL, applications, and future opportunities. It describes optical lithography and nanoimprinting as other patterning techniques. For EBL, it discusses electron beam direct write and electron projection lithography. It covers electron beam resists and their properties. Applications of EBL include nanopatterning, nanowires, gratings, and nanofluidic channels. Future opportunities include double gate FinFET d

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