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Mechanisms and Kinetics of the Thermal Decompositions of Trichlorosilane, Dichlorosilane, and Monochlorosilane by K. L. Walker; R. E. Jardine; M. A. Ring; H. E. O'Neal is a Chemistry article available to read on EtoBox.

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Decomposition studies of trichlorosilane, dichlorosilane, and monochlorosilane at and respectively, are reported. The studies were made at fixed reactant 921 K, 872 K, 806 K, pressures over a range of total pressures in a wall conditioned, quartz reactor connected to a quadrupole mass-spectrometer. Products were monitored sequentially and continuously in time. The dichlorosilane decomposition was also studied by the comparative-rate single-pulse shock-tube method at temperatures around Two mechanisms of decomposition are 1250 K. considered: a silylene based mechanism initiated by molecular elimination reactions (Scheme I), and a free radical based mechanism initiated by bond fission reactions (Scheme V). Modeling tests of these mechanisms show that only the former is consistent with the experimental data. The decompositions are shown to be essentially nonchain processes initiated by the following pressure dependent reactions: HSiCl 94: SiCl ϩ HCl, H SiCl 91: and High pressure Arrhenius parameters recommended for these H SiCl 95: HSiCl ϩ H .

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Author

K. L. Walker; R. E. Jardine; M. A. Ring; H. E. O'Neal

Publisher

John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley (ISSN 0538-8066)

Published

1998

Language

EN

Field

Chemistry (Physical Sciences)