About this scholarly article

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Two-component photoresists based on acidolytic cleavage of novel ester acetal polymer by Wang, Liyuan; Lin, Qinghuang; Chu, Zhanxing; Cheng, Long is a scholarly article available to read on EtoBox.

Author

Wang, Liyuan; Lin, Qinghuang; Chu, Zhanxing; Cheng, Long

Publisher

SPIE

Published

2007