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About this Materials Science article
Characterisation of a-C:H and oxygen-containing Si:C:H films by Raman spectroscopy and XPS by Veres, M.; Koós, M.; Tóth, S.; Füle, M.; Pócsik, I.; Tóth, A.; Mohai, M.; Bertóti, I. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Veres, M.; Koós, M.; Tóth, S.; Füle, M.; Pócsik, I.; Tóth, A.; Mohai, M.; Bertóti, I.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0925-9635)
- Published
- 2005
- Language
- EN
- Field
- Materials Science (Physical Sciences)