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Measurement of Stress-optic Coefficients for Metals in the Visible to Near-infrared Spectrum with Spectroscopic Ellipsometry by Xin Sun; Shibin Wang; Linan Li; Zongze Huo; Lei Wang; Chuanwei Li; Zhiyong Wang is a Engineering article available to read on EtoBox.

What is Measurement of Stress-optic Coefficients for Metals in the Visible to Near-infrared Spectrum with Spectroscopic Ellipsometry about?

The measurement of stress-optic coefficients is of great importance in photoelasticity which can be used in many fields, such as stress measuring and nondestructive testing. In this paper, the stress-optic coefficients of Cu film were measured in the visible to near-infrared spectral range by spectroscopic ellipsometry. In order to determine the stress-optic coefficients, a measuring principle is proposed by the combination of the classic 4 × 4 Matrix method of ellipsometry and the stress-optic law. According to this principle, we establish a quantitative relation between the ellipsometric parameters (Ψ, Δ) and stress, which is related to stress-optic coefficients. The ellipsometric parameters of a thin film/substrate assembly by sputtering Cu on polyimide (PI) were experimentally measured under various stress conditions. Fitting the proposed measuring principle to experimental data, the stress-optic coefficients of Cu film in the visible to near-infrared spectral range were obtained. This research provides insights into stress measuring of metal films, which is widely needed in many application fields such as chip processing.

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Author

Xin Sun; Shibin Wang; Linan Li; Zongze Huo; Lei Wang; Chuanwei Li; Zhiyong Wang

Publisher

Elsevier BV

Published

2023

Language

EN

Field

Engineering (Physical Sciences)