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About this Engineering article
Electron cyclotron resonance etching characteristics of GaN in plasmas with and without hydrogen by Zhang, L.; Ramer, J.; Brown, J.; Zheng, K.; Lester, L.F.; Hersee, S.D. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Zhang, L.; Ramer, J.; Brown, J.; Zheng, K.; Lester, L.F.; Hersee, S.D.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1995
- Language
- EN
- Field
- Engineering (Physical Sciences)
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