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About this Engineering article
Density and Deposition Rate of Chemical-vapour-deposited Boron Nitride by Toshitsugu Matsuda; Hiroyuki Nakae; Toshio Irai is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Toshitsugu Matsuda; Hiroyuki Nakae; Toshio Irai
- Publisher
- Springer; Springer-Verlag; Kluwer Academic Publishers; Springer Science and Business Media LLC; Society for Mining, Metallurgy and Exploration Inc. (ISSN 0022-2461)
- Published
- 1988
- Language
- EN
- Field
- Engineering (Physical Sciences)
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