About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Analysis of trade-off relationships in resist patterns delineated using SFET of Selete by Kozawa, Takahiro; Allen, Robert D.; Oizumi, Hiroaki; Itani, Toshiro; Tagawa, Seiichi is a scholarly article available to read on EtoBox.

Author

Kozawa, Takahiro; Allen, Robert D.; Oizumi, Hiroaki; Itani, Toshiro; Tagawa, Seiichi

Publisher

SPIE

Published

2010

Language

EN