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About this Engineering article
Comprehensive Study and Design of High-k/SiGe Gate Stacks with Interface-Engineering by Ozone Oxidation by Ma, Xueli; Xiang, Jinjuan; Zhou, Lixing; Wang, Xiaolei; Li, Yongliang; Yang, Hong; Zhang, Jing; Zhao, Chao; Yin, Huaxiang; Wang, Wenwu; Ye, Tianchun is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Ma, Xueli; Xiang, Jinjuan; Zhou, Lixing; Wang, Xiaolei; Li, Yongliang; Yang, Hong; Zhang, Jing; Zhao, Chao; Yin, Huaxiang; Wang, Wenwu; Ye, Tianchun
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 2162-8769)
- Published
- 2019
- Language
- EN
- Field
- Engineering (Physical Sciences)