About this scholarly article

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 30 July 2000)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries - In-situ ellipsometric measurements of thin film aluminum oxidation by Lindmark, Eric K.; Nowak, Janusz J.; Kief, Mark T.; Al-Jumaily, Ghanim A.; Duparre, Angela; Singh, Bhanwar is a scholarly article available to read on EtoBox.

Author

Lindmark, Eric K.; Nowak, Janusz J.; Kief, Mark T.; Al-Jumaily, Ghanim A.; Duparre, Angela; Singh, Bhanwar

Publisher

SPIE

Published

2000

Language

EN