About this Engineering article
Thermal Annealing Effects on the Electrical Characteristics of the Back Interface in Nano-silicon-on-insulator Channel by W. Cho; C. Ahn is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- W. Cho; C. Ahn
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2007
- Language
- EN
- Field
- Engineering (Physical Sciences)