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About this Engineering article
Atomistic Study of Self-Diffusion in Ni, Al and Ni3Al by Duan, J.; Osetsky, Yu.N.; Bacon, David J. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Duan, J.; Osetsky, Yu.N.; Bacon, David J.
- Publisher
- Trans Tech Publications, Ltd.; Trans Tech Publications Ltd (ISSN 1662-9507)
- Published
- 2001
- Field
- Engineering (Physical Sciences)
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