About this scholarly article

SPIE Proceedings [SPIE 16th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 18 September 1996)] 16th Annual BACUS Symposium on Photomask Technology and Management - Overlay can be improved by self-calibrated XY measuring instrument: a lattice perspective by Raugh, Michael R.; Rizvi, Syed A.; Shelden, Gilbert V.; Reynolds, James A. is a scholarly article available to read on EtoBox.

Author

Raugh, Michael R.; Rizvi, Syed A.; Shelden, Gilbert V.; Reynolds, James A.

Publisher

SPIE

Published

1996