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Depth Profiling in Secondary Ion Mass Spectrometry for Ultra‐thin Layer with Nanometer Order Thickness by Mesa‐structure Fabrication by S. Seki; H. Tamura; Y. Wada; K. Tsutsui is a Engineering article available to read on EtoBox.
What is Depth Profiling in Secondary Ion Mass Spectrometry for Ultra‐thin Layer with Nanometer Order Thickness by Mesa‐structure Fabrication about?
We attempted to make an accurate depth profiling in secondary ion mass spectrometry (SIMS) including backside SIMS for ultra‐thin nanometer order layer. The depth profiles for HfO~2~ layers that were 3 and 5 nm thick in a‐Si/HfO~2~/Si were measured using quadrupole and magnetic sector type SIMS instruments. The depth profiling for an ultra‐thin layer with a high depth resolution strongly depends on how the crater‐edge and knock‐on effects can be properly reduced. Therefore, it is important to control the analyzing conditions, such as the primary ion energy, the beam focusing size, the incidence angle, the rastered area, and detected area to reduce these effects. The crater‐edge effect was significantly reduced by fabricating the sample into a mesa‐shaped structure using a photolithography technique. The knock‐on effect will be serious when the depth of the layer of interest from the surface is located within the depth of the ion mixing region due to the penetration of the primary ions. Finally, we were able to separately assign the origin of the distortion to the crater‐edge effect and knock‐on effect. Copyright © 2012 John Wiley & Sons, Ltd.
Who reads Depth Profiling in Secondary Ion Mass Spectrometry for Ultra‐thin Layer with Nanometer Order Thickness by Mesa‐structure Fabrication?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- S. Seki; H. Tamura; Y. Wada; K. Tsutsui
- Publisher
- John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley; Research Square (ISSN 0142-2421)
- Published
- 2012
- Language
- EN
- Field
- Engineering (Physical Sciences)